| 发明名称 |
Mask for use in lithography, lithographic apparatus, and device manufacturing methods |
| 摘要 |
A reflective mask has a sub-resolution texture applied to absorbing areas to reduce the amount of power in the specular reflection. The texture may form a phase contrast grating or may be a diffuser. The same technique may be applied to the other absorbers in a lithographic apparatus. <IMAGE>A reflective mask has a sub-resolution texture applied to absorbing areas to reduce the amount of power in the specular reflection. The texture may form a phase contrast grating or may be a diffuser. The same technique may be applied to the other absorbers in a lithographic apparatus. <IMAGE> |
| 申请公布号 |
EP1357427(B1) |
申请公布日期 |
2006.10.25 |
| 申请号 |
EP20030251348 |
申请日期 |
2003.03.06 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
EURLINGS, MARKUS FRANCISCUS ANTONIUS;VAN DIJSSELDONK, ANTONIUS JOHANNES JOSEPHUS;DIERICHS, MARCEL MATHIJS THEODORE MARIE |
| 分类号 |
G03F1/24;G03F1/46;G03F7/20 |
主分类号 |
G03F1/24 |
| 代理机构 |
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代理人 |
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| 地址 |
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