发明名称 |
APPARATUS FOR MEASURING THICKNESS PROFILE AND REFRACTIVE INDEX DISTRIBUTION OF MULTIPLE LAYERS OF THIN FILMS BY MEANS OF TWO-DIMENSIONAL REFLECTOMETRY AND METHOD OF MEASURING THE SAME |
摘要 |
The present invention relates to a non-contact, non-destructive measuring apparatus that measures thickness profile and refractive index distribution of a single or multiple layers of thin films by means of the principle of reflectometry. According to the present invention, by employing more than one narrow band-pass optical filters and a two-dimensional array of CCD sensors, and by finding an optimal solution for the nonlinear functional relationship between the thickness of said thin film or thin films and the corresponding refractive indexes by using an iterative numerical computation method, said apparatus simultaneously measures local area-wise thickness profile and refractive index distribution among others of said a single layer or multiple layers of thin films on a substrate. |
申请公布号 |
EP1430270(A4) |
申请公布日期 |
2006.10.25 |
申请号 |
EP20020798860 |
申请日期 |
2002.09.23 |
申请人 |
KMAC |
发明人 |
KIM, YEONG-RYEOL;PARK, JI-JONG;KIM, JIN-YONG;LEE, JOONG-WHAN |
分类号 |
G01B11/02;G01B11/06;G01N21/45 |
主分类号 |
G01B11/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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