发明名称 Silicided buried bitline process for a non-volatile memory cell
摘要 A process of fabricating a memory cell that includes a substrate that has a first region and a second region with a channel therebetween by forming a gate above the channel of the substrate, forming a bitline and siliciding the bitline.
申请公布号 US7125763(B1) 申请公布日期 2006.10.24
申请号 US20010885426 申请日期 2001.06.19
申请人 SPANSION LLC 发明人 SOBEK DANIEL;THURGATE TIMOTHY J.;RANDOLPH MARK W.
分类号 H01L21/8238 主分类号 H01L21/8238
代理机构 代理人
主权项
地址