发明名称 MIM CAPACITOR AND MANUFACTURING METHOD OF IT
摘要 An MIM capacitor and a manufacturing method thereof are provided to obtain high Q-factor characteristics by using low resistances of upper and lower electrodes. An MIM capacitor comprises a lower electrode, an insulating layer, and an upper electrode. The lower electrode is composed of a first tantalum nitride layer(20) connected to a minus connection line and a first alpha-tantalum layer(30) on the first tantalum nitride layer. The insulating layer(40) is formed on the first alpha-tantalum layer. The upper electrode is formed on the insulating layer. The upper electrode is composed of a second tantalum nitride layer(50) and a second alpha-tantalum layer(60) connected to a plug connection line.
申请公布号 KR20060110069(A) 申请公布日期 2006.10.24
申请号 KR20050032238 申请日期 2005.04.19
申请人 MAGNACHIP SEMICONDUCTOR, LTD. 发明人 LEE, SEONG WOO;SHIN, CHAN SOO
分类号 H01L27/108 主分类号 H01L27/108
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