发明名称 |
MIM CAPACITOR AND MANUFACTURING METHOD OF IT |
摘要 |
An MIM capacitor and a manufacturing method thereof are provided to obtain high Q-factor characteristics by using low resistances of upper and lower electrodes. An MIM capacitor comprises a lower electrode, an insulating layer, and an upper electrode. The lower electrode is composed of a first tantalum nitride layer(20) connected to a minus connection line and a first alpha-tantalum layer(30) on the first tantalum nitride layer. The insulating layer(40) is formed on the first alpha-tantalum layer. The upper electrode is formed on the insulating layer. The upper electrode is composed of a second tantalum nitride layer(50) and a second alpha-tantalum layer(60) connected to a plug connection line.
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申请公布号 |
KR20060110069(A) |
申请公布日期 |
2006.10.24 |
申请号 |
KR20050032238 |
申请日期 |
2005.04.19 |
申请人 |
MAGNACHIP SEMICONDUCTOR, LTD. |
发明人 |
LEE, SEONG WOO;SHIN, CHAN SOO |
分类号 |
H01L27/108 |
主分类号 |
H01L27/108 |
代理机构 |
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