| 摘要 |
An indium oxide-tin oxide powder containing an In-Sn oxide as a main component, characterized in that an intermetallic compound In4Sn3O12 is not detected by the X-ray diffraction, and the amount of SnO2 dissolved in In2O3 as one component of a solid solution, which is calculated from the precipitated amount (mass %) of SnO2 determined from the ratio of In2O3(222)integral diffraction intensity and SnO2(110) integral diffraction intensity, is 2.3 mass % or more; and a sputtering target using the above indium oxide-tin oxide powder. The above indium oxide-tin oxide powder can be produced at a low cost, can provide a sputtering target having a high density, and can provide a target having a prolonged life.
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