发明名称 |
STENCIL MASK, ITS MANUFACTURING METHOD AND METHOD OF USE THEREOF |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To solve the problem that a thin layer of a stencil mask rises in its temperature owing to ionized atoms coming into collision therewith and is deformed by the heat produced thereby. <P>SOLUTION: The stencil mask 100 comprises the thin layer 25, and a thick layer 35 stacked on one surface of the thin layer 25. The thin layer 25 has a narrowed thin layer through-hole 22 formed therein, and the thick layer 35 has a wide thick layer through-hole 38 formed therein. The thin layer through hole 22 and the thick layer through-hole 38 are paired and communicated with each other. A step is formed between a side surface 29 of the thin layer 25 defining the thin layer through-hole 22 and a side surface of the thick layer 35 defining the thick layer through-hole 38. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
申请公布号 |
JP2006287005(A) |
申请公布日期 |
2006.10.19 |
申请号 |
JP20050105718 |
申请日期 |
2005.04.01 |
申请人 |
TOYOTA MOTOR CORP |
发明人 |
IKEDA TOMOHARU;NISHIWAKI TAKESHI |
分类号 |
H01L21/027;G03F1/20;G03F1/22;G03F7/20;H01J9/14;H01J37/317;H01L21/265;H01L21/266 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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