| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus in which processing liquid to be collected can be prevented from being mixed with other type of processing liquid without causing degradation in processing throughput when the processing liquid used for processing a substrte is recovered, and to provide a substrate processing method in which the processing liquid can be collected without being mixed with other type of processing liquid even when the collected processing liquid is reused for processing and good processing of the substrate can be achieved. SOLUTION: An inner structural member 19, a middle structural member 20 and an outer structural member 21 can be elevated/lowered independently from each other. When a transition is made from a processing employing a first chemical to a rinse process, the inner structural member 19 and the middle structural member 20 are elevated while being synchronized under such a state as an extremely small clearance is sustained between the upper end 25b of the first guide portion 25 of the inner structural member 19 and the upper end 48b of the second guide portion 48 of the middle structural member 20. COPYRIGHT: (C)2007,JPO&INPIT
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