| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a step-system proximity exposure method that can enhance the transfer accuracy of an exposure pattern onto a substrate, even when detection accuracy of an optical measurement sensor, such as a laser interferometer, tends to deteriorate. <P>SOLUTION: An exposed substrate WS on which the exposure pattern of a mask is transferred is held again on a substrate stage. After the exposed substrate WS is moved stepwise, the positional shift between the exposed substrate WS, and the exposure pattern of the mask M is measured by an exposure pattern positional shift detecting means 46. Then correction amounts Cx, Cy, Cθ are calculated, based on the positional shift amounts Zx', Zy', Zθ' measured by the exposure pattern positional shift detecting means 46. A mask position adjusting means 42, 44 are controlled, based on the correction amounts Cx, Cy, Cθ to correct the position of the mask M. <P>COPYRIGHT: (C)2007,JPO&INPIT |
