发明名称 EXPOSURE DEVICE AND MANUFACTURING METHOD THEREFOR
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure device which supplies a gas of almost uniform current to a space in which a stage device is housed, and is easy to maintain. <P>SOLUTION: The exposure device EX comprises a stage 22 which can move while holding an object W; and a sheet member 100 which partitions a space in which the stage 22 is arranged into a first space 46b for housing the stage 22, and a second space 46a into which a gas A flows from a gas supply source 70. The sheet member 100 comprises a plurality of air holes by which the first space 46b and the second space 46a are communicated with each other, forms a gas supply surface for supplying the gas A to the first space 46b, and is made of a flexible material. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006287160(A) 申请公布日期 2006.10.19
申请号 JP20050108538 申请日期 2005.04.05
申请人 NIKON CORP 发明人 NAGAHASHI RYOCHI;HAYASHIYAMA SATONAMI;HAGIWARA SHIGERU;SHIRATA YOSUKE
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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