| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an optical system in which the flare light quantity at a mirror surface does not fluctuate so much. <P>SOLUTION: Substrates are polished using an ion beam (Step S1). After the completion of polishing of the substrates, the mirror substrates are measured for undulation shape (Step S2). Subsequently, the in-field flare light quantity distribution of an optical system is computed based on the undulation shape distribution of each mirror (Step S3). Such a correction amount is computed for undulation shape distribution in mirror that unevenness in the light quantity of flare is reduced (Step S4). The mirror is polished again to be provided with the above undulation shape distribution (Step S5). These mirror substrates are coated with a multilayer film (Step S6), and a projection optical system is assembled (Step S7). This projection optical system is mounted on an aligner (Step S8), and exposure evaluation is carried out to measure flare amount distribution (Step S9). When the above steps were followed, unevenness of 2% was measured which is substantially the same value as of the flare distribution estimated from computation. <P>COPYRIGHT: (C)2007,JPO&INPIT |
