发明名称 Lithographic apparatus and device manufacturing method
摘要 In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.
申请公布号 US2006232756(A1) 申请公布日期 2006.10.19
申请号 US20050239480 申请日期 2005.09.30
申请人 发明人 LOF JOERI;DERKSEN ANTONIUS THEODORUS A.M.;HOOGENDAM CHRISTIAAN A.;KOLESNYCHENKO ALEKSEY;LOOPSTRA ERIK R.;MODDERMAN THEODORUS M.;MULKENS JOHANNES CATHARINUS H.;RITSEMA ROELOF AEILKO S.;SIMON KLAUS;DE SMIT JOANNES T.;STRAAIJER ALEXANDER;STREEFKERK BOB;SANTEN HELMAR V.;DONDERS SJOERD NICOLAAS L.
分类号 G03B27/42 主分类号 G03B27/42
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