| 发明名称 |
Chemischer Bedampfungs-Reaktor |
| 摘要 |
A chemical vapor deposition reactor has a rotatable wafer carrier which cooperates with a chamber of the reactor to facilitate laminar flow of reaction gas within the chamber. The chemical vapor deposition reactor can be used in the fabrication of LEDs and the like. |
| 申请公布号 |
DE112004001308(T5) |
申请公布日期 |
2006.10.19 |
| 申请号 |
DE20041101308 |
申请日期 |
2004.06.29 |
| 申请人 |
ELITE OPTOELECTRONICS INC. |
发明人 |
LIU, HENG |
| 分类号 |
C23C16/455;C23C16/44;C23C16/458;C30B25/14;C30B29/40;H01L21/00 |
主分类号 |
C23C16/455 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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