| 摘要 |
PROBLEM TO BE SOLVED: To provide a technology for manufacturing a transfer master disk which enables highly accurate transfer to be performed even when higher definition of a transfer pattern is attained. SOLUTION: The die 40 of a transfer master disk substrate is manufactured by sequentially performing a step (A) of applying a resist 31 onto a flat substrate 20 and performing exposure and development to form a resist pattern R1 having a plurality of uneven patterns extending in a circumferential direction to the radially different positions, a step (B) of measuring the pattern line width of the resist pattern R1 in radially different n places (n≥2), obtaining the deviation Dx (x=1 to n) of each measured line width Wx from a desired line width, and obtaining the average value Dave of the deviation Dx of all the measured places, a step (C) of performing selective etching to form a resist pattern R2 under conditions that the pattern line width becomes thinner by an amount equal to the average value Dave for the resist pattern R1, and a step (D) of etching the flat substrate 20 by using the resist pattern R2 as a mask. COPYRIGHT: (C)2007,JPO&INPIT
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