| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a liquid jetting head capable of substantially making delivering characteristics uniform. SOLUTION: The method for manufacturing a liquid jetting head at least comprises an etching process for simultaneously forming feeding spouts corresponding to a plurality of respective flow path substrates on a silicon wafer by etching the silicon wafer integrally formed with a plurality of the flow path substrates for a definite time using a specified protective film as a mask, and a dividing process for dividing the silicon wafer on which the feeding spouts are formed into a plurality of the flow path substrates. In the etching process, the flow path resistances of respective feeding spouts formed on the silicon wafer are made uniform by substantially adjusting at least either one of the width or the length of a narrow channel constituting the divided flow path part of the feeding spouts in accordance with the position within the surface of the silicon wafer. COPYRIGHT: (C)2007,JPO&INPIT
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