| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which can obtain significant solubility contrast regardless of kind of a polymer precursor, especially a polyimide precursor, consequently which can obtain good profile patterns while maintaining an enough process margin. <P>SOLUTION: The photosensitive resin composition comprises an N-aromatic glycine derivative expressed by formula (1) and a polymer precursor. In the formula, a circle circumscribing symbol A expresses an aromatic ring, R<SP>a</SP>, R<SP>b</SP>, R<SP>c</SP>, R<SP>d</SP>and R<SP>e</SP>is hydrogen or a monovalent organic group, m is an integer of zero or more, n is an integer of one or more, and the sum total of m and n is a number of the position on an aromatic ring which can be substituted. <P>COPYRIGHT: (C)2007,JPO&INPIT |
