发明名称 |
Sputtering target, sintered compact, electrically conductive film produced by using the same, and organic EL device and substrate used for the same |
摘要 |
A sintered article is fabricated which contains one or more of indium oxide, zinc oxide, and tin oxide as a component thereof and contains any one or more types of metal out of hafnium oxide, tantalum oxide, lanthanide oxide, and bismuth oxide. A backing plate is attached to this sintered article to constitute a sputtering target. This sputtering target is used to fabricate a conductive film on a predetermined substrate by sputtering. This conductive film achieves a large work function while maintaining as much transparency as heretofore. This conductive film can be used to achieve an EL device or the like of improved hole injection efficiency. |
申请公布号 |
US2006234088(A1) |
申请公布日期 |
2006.10.19 |
申请号 |
US20060454006 |
申请日期 |
2006.06.16 |
申请人 |
IDEMITSU KOSAN CO., LTD. |
发明人 |
INOUE KAZUYOSHI;KAWAMURA HISAYUKI |
分类号 |
B32B19/00;C03C27/00;C04B35/50;C23C14/08;C23C14/34;H01L51/00;H01L51/40;H01L51/50;H01L51/52 |
主分类号 |
B32B19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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