MATERIAL FOR PATTERN FORMATION, APPARATUS FOR PATTERN FORMATION, AND METHOD FOR PATTERN FORMATION

摘要

This invention relates to a material for pattern formation. The material comprises a support and at least a photosensitive layer provided on the support. The photosensitive layer is formed of a photosensitive composition comprising an alkali-soluble binder, a polymerizable monomer, and a photopolymerization initiator. The melt viscosity of the photosensitive composition is 1 × 10<SUP>4</SUP> to 1 × 10<SUP>7</SUP> mPa·s at 30ºC to 40ºC. The minimum exposure in a laser beam at a wavelength of 405 nm satisfying that the thickness of a pattern provided by the exposure and development of the photosensitive layer is 90% of the thickness in the unexposed state, is not more than 20 mJ/cm<SUP>2</SUP>.