发明名称 CONTINUOUS PLATING EQUIPMENT AND METHOD FOR FILM
摘要 PROBLEM TO BE SOLVED: To provide a continuous plating equipment for a film by which the long-sized base material film can be continuously plated without being exerted with conveyance tension. SOLUTION: The plating equipment is equipped with a winding apparatus 7 for conveying a long-sized base material film 10 joined with the belt-like support members 11 near both ends in a transverse direction so as to extend in a longitudinal direction by exerting conveyance tension to the support members 11, and a plating tank 1 for applying plating to the base material film 10 by making the base material film 10 pass through a plating solution. Since the conveyance of the base material film 10 is performed by exerting the conveyance tension to the support members 11, the base material film 10 is kept substantially free from the conveyance tension and consequently, the plating layer is formed in the state that the base material film 10 is not completely elongated. The occurrence of conventional problems, such as curling and wrinkling of an FPC due to remaining of a residual stress in the base material film and degradation in dimensional accuracy, is thus obviated. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006283044(A) 申请公布日期 2006.10.19
申请号 JP20050100527 申请日期 2005.03.31
申请人 HYOMEN SHORI SYSTEM:KK 发明人 NISHIO SHOICHI;NISHIO TOSHIHIRO
分类号 C25D7/06;C25D17/06 主分类号 C25D7/06
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