Substrate processing apparatus, substrate processing method, and substrate holding apparatus

摘要

The present invention relates to a substrate processing apparatus and a substrate processing method for performing a chemical liquid process, a cleaning process, a drying process, or the like while rotating a substrate such as a semiconductor wafer or a liquid crystal substrate. The present invention also relates to a substrate holding apparatus for holding and rotating a substrate. The substrate processing apparatus ( 1 ) for processing a substrate (W) while supplying a fluid to the substrate (W) includes a substrate holder ( 11 ) for holding and rotating the substrate (W), and a holder suction unit (24) for sucking the fluid from the substrate holder ( 11 ). The substrate holding apparatus includes a plurality of rollers (20) which are brought into contact with an edge portion of a substrate (W) so as to hold and rotate the substrate (W), and at least one moving mechanism ( 303 a) for moving the rollers ( 20 ).