发明名称 |
Computer Program Products for Measuring Critical Dimensions of Fine Patterns Using Scanning Electron Microscope Pictures and Secondary Electron Signal Profiles |
摘要 |
A pattern is inspected by acquiring a scanning electron microscope picture of an inspection pattern, and acquiring a scanning electron microscope secondary electron signal profile of the inspection pattern. A determination is made as to whether the inspection pattern is defective by comparing the scanning electron microscope picture of the inspection pattern to a scanning electron microscope picture of a sample pattern, and by comparing the scanning electron microscope secondary electron signal profile of the inspection pattern to a scanning electron microscope secondary electron signal profile of a sample pattern.
|
申请公布号 |
US2006231753(A1) |
申请公布日期 |
2006.10.19 |
申请号 |
US20060426713 |
申请日期 |
2006.06.27 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KANG MIN-SUB;LEE SANG-KIL;KIM KWANG-SIK;JUNG KYUNG-HO;KIM SUNG-JOONG |
分类号 |
G01N23/00;H01L21/66;G01Q10/04;H01J37/22;H01J37/28;H01L21/027 |
主分类号 |
G01N23/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|