| 摘要 |
PROBLEM TO BE SOLVED: To control film properties at high accuracy by a base material processing apparatus, which is provided for forming a translucent film on the surface of a base material or for performing film processing to the translucent film formed on the surface of the base material, and to perform a real-time measurement of the film properties of the translucent film. SOLUTION: The base material 10 processing apparatus 1 is provided with a light irradiation means 50 for applying a light L from a translucent film side with respect to the base material 10, on which the translucent film is being formed on the surface or to which the film processing is being performed to the translucent film formed on the surface of the base material 10, and a film property measuring means 60, which receives a reflected light R of the light L from the base material 10, during film formation or during the film processing, detects the interference light of a first reflecting light, which is included in the reflected light R and is reflected at the surface of the translucent film, and a second reflecting light, which is reflected at the interface between the translucent film and the base material 10, and measures the film properties of the translucent film by a peak-valley method. COPYRIGHT: (C)2007,JPO&INPIT |
