| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a proximity exposure device capable of proximity-exposing various substrates differing in size with high precision. <P>SOLUTION: The proximity exposure device having a masking mechanism 20 making a mask plate M according to an exposed region, and the masking mechanism 20 has upper light shield plates 21a to 21d forming a rectangular aperture over the mask plate M, an aperture adjusting mechanism 23 adjusting the size of the aperture formed by the upper light shield plates 21a to 21d, lower light shield plates 26a to 26d arranged below the upper light shield plates 21a to 21d, and a lower light shield plate sending mechanism section which drives and sends the lower light shield plates 26a to 26d in prescribed directions, respectively. <P>COPYRIGHT: (C)2007,JPO&INPIT |
