METHOD AND MOLD FOR MANUFACTURING A CONTINUOUS MICROLENS

摘要

The present invention provides a method for manufacturing a continuous microlens on a light guiding plate using a semiconductor reflow process. The method comprises a first step of aligning a mask, which includes a first region through which light can be transmitted and a plurality of second regions through which light cannot be transmitted, on a substrate coated with a photoresist and performing a light-exposing process; a second step of developing the light-exposed substrate to obtain a plurality of photoresists in the form of posts; a third step of performing a reflow process to allow the post-shaped photoresists to be curved until the post-shaped photoresists are combined with photoresists adjacent thereto in one direction to form a continuous microlens feature; a fourth step of fabricating a depressed stamper such that the photoresists defining the continuous microlens feature are engraved in a depressed fashion in the depressed stamper; and a fifth step of forming a light guiding plate by using the depressed stamper as a mold such that the continuous microlens is formed in the light guiding plate in a raised pattern.