发明名称 Crystallographic metrology and process control
摘要 A system ( 70 ) for crystallography including a sample holder ( 74 ), an electron source ( 76 ) for generating an electron beam, and a scanning actuator ( 80 ) for controlling the relative movement between the electron beam and the crystalline sample, the scanning actuator being controllable for directing the electron beam at a series of spaced apart points within the sample area. The system also includes an image processor ( 84 ) for generating crystallographic data based upon electron diffraction from the crystalline sample and for determining whether sufficient data have been acquired to characterize the sample area The system further includes a controller ( 86 ) for controlling the scanning actuator to space the points apart such that acquired data is representative of a different grains within the crystalline sample. IN other embodiments, the invention includes one or more ion beams ( 178, 188 ) for crystallography and a combination ion beam/electron beam ( 218, 228 ).
申请公布号 US2006231752(A1) 申请公布日期 2006.10.19
申请号 US20050505198 申请日期 2005.03.02
申请人 HOUGE ERIK C;KEMPSHALL BRIAN;SCHWARZ STEPHEN M;STEVIE F A 发明人 HOUGE ERIK C.;KEMPSHALL BRIAN;SCHWARZ STEPHEN M.;STEVIE F.A.
分类号 G01N23/00;G21K7/00 主分类号 G01N23/00
代理机构 代理人
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