发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and a first support for supporting a patterning device that serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one gas generator for generating a conditioned gas flow. The gas generator includes a guiding element for guiding the gas flow to a lower volume generally located below a lower surface of the projection system and to a volume between the lower surface and the substrate. The guiding element directs the gas flow in a generally downward direction and then in a direction generally parallel to the lower surface.
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申请公布号 |
US2006232754(A1) |
申请公布日期 |
2006.10.19 |
申请号 |
US20060437745 |
申请日期 |
2006.05.22 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LALLEMANT NICOLAS A.;VERHAGEN MARTINUS C.M.;BECKERS MARCEL;STULTIENS RONALD;SMITS PASCAL A.;HERTOG WLADIMIR FRANSISCUS G.M.;VAN DER PLAS DAVID T.W.;KOELINK STEPHAN;KRUS HENK |
分类号 |
G03B27/52;G03F7/20;H01L21/027 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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