| 摘要 |
PROBLEM TO BE SOLVED: To remove fine particles sufficiently without causing any damage on the surface of an electronic device. SOLUTION: An apparatus for cleaning an electronic device comprises a section 50 for supplying cleaning liquid containing organic solvent, a section 40 for supplying high pressure nitrogen, and a two-fluid nozzle 30 for spraying the cleaning liquid to a semiconductor wafer W while mixing with high pressure nitrogen. COPYRIGHT: (C)2007,JPO&INPIT
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