| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processor where processing liquid which splashes from a substrate can be classified while air current at the periphery of the substrate is prevented from being disturbed under an environment where a downflow is formed. SOLUTION: An inner structure member 19, a middle structure member 20, and an outer structure member 21 are arranged to surround the periphery of a spin chuck 1. The inner structure member 19, the middle structure member 20, and the outer structure member 21 can independently ascend and descend. When processing a wafer W, the downflow is formed. The inner structure member 19 and the middle structure member 20 ascend and descend in a state where the position of the outer structure member 21 is fixed under the environment where an inside of a disposal groove 26 is compulsorily exhausted. Thus, first chemical, second chemical and pure water are discriminated and collected or disposed. COPYRIGHT: (C)2007,JPO&INPIT
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