发明名称 Pattern forming materials and pattern formation method using the materials
摘要 A pattern forming materials includes a thermal sensitive material layer formed on a target substrate, a first light-to-heat converting layer formed between the thermal sensitive material layer and the target substrate, and a second light-to-heat converting layer formed on a surface of the thermal sensitive material layer opposite to the first light-to-heat converting layer, the thermal sensitive material layer being interposed between the first and second light-to-heat converting layers. A higher aspect ratio fine pattern can be formed in the thermal sensitive material layer made of photoresist using heat generated in the first and second light-to-heat converting layers formed on both surfaces of the thermal sensitive material layer.
申请公布号 US2006234168(A1) 申请公布日期 2006.10.19
申请号 US20030531897 申请日期 2003.10.20
申请人 KIM JOO-HO;TOMINAGA JUNJI 发明人 KIM JOO-HO;TOMINAGA JUNJI
分类号 G03C5/00;G03F7/11;B41M5/26;B41M5/36;G03F7/004;G03F7/38;G11B7/26;H01L21/027 主分类号 G03C5/00
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