发明名称 |
Pattern forming materials and pattern formation method using the materials |
摘要 |
A pattern forming materials includes a thermal sensitive material layer formed on a target substrate, a first light-to-heat converting layer formed between the thermal sensitive material layer and the target substrate, and a second light-to-heat converting layer formed on a surface of the thermal sensitive material layer opposite to the first light-to-heat converting layer, the thermal sensitive material layer being interposed between the first and second light-to-heat converting layers. A higher aspect ratio fine pattern can be formed in the thermal sensitive material layer made of photoresist using heat generated in the first and second light-to-heat converting layers formed on both surfaces of the thermal sensitive material layer.
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申请公布号 |
US2006234168(A1) |
申请公布日期 |
2006.10.19 |
申请号 |
US20030531897 |
申请日期 |
2003.10.20 |
申请人 |
KIM JOO-HO;TOMINAGA JUNJI |
发明人 |
KIM JOO-HO;TOMINAGA JUNJI |
分类号 |
G03C5/00;G03F7/11;B41M5/26;B41M5/36;G03F7/004;G03F7/38;G11B7/26;H01L21/027 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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