发明名称 VACUUM PLASMA GENERATOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a vacuum plasma generator (VPG) hardly affected by electromagnetic radiation from an environment to the utmost, at the same time, outputting the radiation toward the environment to the utmost. <P>SOLUTION: The VPG 1 having an output terminal 2 for connecting the VPG 1 to at least one electrode 3 of a plasma chamber 5 comprises a power supply terminal 5 for connecting the VPG 1 to a voltage supplying network 7, a power input side filter 13, a voltage converter 9 for forming an output signal, having a voltage conversion control part input side 10 for connecting itself to the voltage conversion control part 11, and a shield part 14. Here, the shield part 14 surrounds at least the voltage converter 9, and the whole of VPG 1 has a connection part 19 connecting the shield part 14 to the plasma chamber 5, having low resistance at a high frequency. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006286633(A) 申请公布日期 2006.10.19
申请号 JP20060093552 申请日期 2006.03.30
申请人 HUETTINGER ELEKTRONIK GMBH & CO KG 发明人 EYHORN THORSTEN;NITSCHKE MORITZ;WIEDEMUTH PETER;ZAHRINGER GERHARD
分类号 H05H1/46;H01J37/32 主分类号 H05H1/46
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