发明名称 |
Polyimide-Silikonharz, dieses Harz enthaltende Lösung und Polyimide-Silikonharz-Film |
摘要 |
<p>A polyimide silicone resin which is obtained from a diamine containing an acid dianhydride and a diaminopolysiloxane, contains 50% by weight or more of a siloxane residual group and has an elongation at rapture of 400% or higher and a modulus of elasticity of 500 N/mm<2> or lower. Also disclosed are a polyimide silicone resin solution composition comprising this polyimide silicone resin and a ketone solvent having a boiling point of 130 DEG C or below, and a polyimide silicone resin film comprising this polyimide silicone resin and formed on a substrate. The polyimide silicone resin can form films at relatively low temperature, has superior adhesiveness to substrates and durability under conditions of high humidity and also has low stress and high elongation.</p> |
申请公布号 |
DE60117895(T2) |
申请公布日期 |
2006.10.19 |
申请号 |
DE2001617895T |
申请日期 |
2001.06.26 |
申请人 |
SHIN-ETSU CHEMICAL CO. LTD. |
发明人 |
SUGO, MICHIHIRO;KATO,HIDETO |
分类号 |
C08G77/455;C09D5/25;C08G73/10;C08L83/10;C09D183/08;H01L21/312;H01L23/29;H01L23/31;H05K3/28 |
主分类号 |
C08G77/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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