Method of controlling local etching or deposition in modification of surfaces with pulsed determination of a removal or deposition profile ion streams useful in the high accuracy forming of optical component surfaces involving

摘要

Method of controlling local etching or deposition in modification of surfaces with pulsed ion streams involving determination of a removal m deposition profile, followed by guiding an ion or particle beam over the probe or part of it, so that local etching or material removal occurs at the ion or particle beam site corresponding to a predetermined rate thru a combination of dwell time and pulse length of an n beam from an electrically controllably shaped ion source, and a locally adapted or predetermined material removal or deposition profile is obtained.