| 摘要 |
<p>An apparatus for removing a non-active region of a wet processed substrate is provided to minimize reaction between a solvent and a photoresist layer and uniform a removed surface of the edge by not spraying solvent solution on a coating substrate. A rail(210) makes a wet processed substrate(200) mounted on a tray unit(220) move to a certain direction along a certain route. The tray unit includes a slider(212), a fixing unit(214), and a plate(216). The slider is fixed and coupled to a lower portion of the tray unit. The slider is coupled to the rail to make the tray unit move along the rail. The fixing unit fixes the substrate mounted on the tray unit. A roller unit(230) removes liquid chemical to the edge region of the substrate. The roller is formed to be separated from the tray unit.</p> |
