发明名称 |
LOW-POWER MULTIPLE-CHANNEL FULLY DEPLETED QUANTUM WELL CMOSFETS |
摘要 |
<p>A multiple-channel semiconductor device has fully or partially depleted quantum wells and is especially useful in ultra large scale integration devices, such as CMOSFETs. Multiple channel regions (15) are provided on a substrate (12) with a gate electrode (16) formed on the uppermost channel region (15), separated by a gate oxide (14c), for example. The vertical stacking of multiple channels (15) and the gate electrode (16) permit increased drive current in a semiconductor device without increasing the silicon area occupied by the device.</p> |
申请公布号 |
KR20060108672(A) |
申请公布日期 |
2006.10.18 |
申请号 |
KR20067009128 |
申请日期 |
2006.05.10 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
PAN JAMES N.;PELLERIN JOHN G.;CHEEK JON D. |
分类号 |
H01L29/78;H01L21/336;H01L29/786 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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