发明名称 LOW-POWER MULTIPLE-CHANNEL FULLY DEPLETED QUANTUM WELL CMOSFETS
摘要 <p>A multiple-channel semiconductor device has fully or partially depleted quantum wells and is especially useful in ultra large scale integration devices, such as CMOSFETs. Multiple channel regions (15) are provided on a substrate (12) with a gate electrode (16) formed on the uppermost channel region (15), separated by a gate oxide (14c), for example. The vertical stacking of multiple channels (15) and the gate electrode (16) permit increased drive current in a semiconductor device without increasing the silicon area occupied by the device.</p>
申请公布号 KR20060108672(A) 申请公布日期 2006.10.18
申请号 KR20067009128 申请日期 2006.05.10
申请人 ADVANCED MICRO DEVICES, INC. 发明人 PAN JAMES N.;PELLERIN JOHN G.;CHEEK JON D.
分类号 H01L29/78;H01L21/336;H01L29/786 主分类号 H01L29/78
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