发明名称 Method to inspect a wafer
摘要 The method involves taking an image of a wafer, and automatically evaluating the image by comparing a histogram (94) of the taken image with a histogram (93) of a reference image. The histogram is a color value histogram or a gray value histogram. The image of the wafer is automatically taken again if necessary in dependence of the evaluation and is evaluated for inspection of a surface of the wafer. The histogram represents a highly reduced and quantitatively comparable dataset of the image.
申请公布号 EP1712898(A1) 申请公布日期 2006.10.18
申请号 EP20060101302 申请日期 2006.02.06
申请人 LEICA MICROSYSTEMS JENA GMBH 发明人 WIENECKE, JOACHIM;WOLTER, DETLEF
分类号 G01N21/956;G01N21/88;G01R31/308;G06T5/50;G06T7/00;H01L21/66 主分类号 G01N21/956
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