发明名称 |
Method to inspect a wafer |
摘要 |
The method involves taking an image of a wafer, and automatically evaluating the image by comparing a histogram (94) of the taken image with a histogram (93) of a reference image. The histogram is a color value histogram or a gray value histogram. The image of the wafer is automatically taken again if necessary in dependence of the evaluation and is evaluated for inspection of a surface of the wafer. The histogram represents a highly reduced and quantitatively comparable dataset of the image. |
申请公布号 |
EP1712898(A1) |
申请公布日期 |
2006.10.18 |
申请号 |
EP20060101302 |
申请日期 |
2006.02.06 |
申请人 |
LEICA MICROSYSTEMS JENA GMBH |
发明人 |
WIENECKE, JOACHIM;WOLTER, DETLEF |
分类号 |
G01N21/956;G01N21/88;G01R31/308;G06T5/50;G06T7/00;H01L21/66 |
主分类号 |
G01N21/956 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|