RADIAL-BIASED POLISHING PAD

摘要

A polishing layer (140) has an annular polishing track (125) concentric with rotational center (102). The radial micro-channels are formed in the polishing layer within width (133) of the annular polishing track and a majority of the micro channels have a radial orientation and an average width less than 50mu m. An independent claim is included for substrate polishing method.