发明名称 Back end interconnect with a shaped interface
摘要 An interconnect structure in the back end of the line of an integrated circuit forms contacts between successive layers by removing material in the top surface of the lower interconnect in a cone-shaped aperture, the removal process extending through the liner of the upper aperture, and depositing a second liner extending down into the cone-shaped aperture, thereby increasing the mechanical strength of the contact, which then enhance the overall reliability of the integrated circuit.
申请公布号 US7122462(B2) 申请公布日期 2006.10.17
申请号 US20030707122 申请日期 2003.11.21
申请人 INFINEON TECHNOLOGIES, AG 发明人 CLEVENGER LAWRENCE A.;COWLEY ANDREW P.;DALTON TIMOTHY J.;HOINKIS MARK;KALDOR STEFFEN K.;KALTALIOGLU ERDEM;KUMAR KAUSHIK A.;LA TULIPE, JR. DOUGLAS C.;SCHACHT JOCHEN;SIMON ANDREW H.;SPOONER TERRY A.;WANG YUN-YU;WANN CLEMENT H.;YANG CHIH-CHAO
分类号 H01L21/4763;H01L21/44;H01L21/768;H01L23/522;H01L23/532 主分类号 H01L21/4763
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