| 摘要 |
A method of processing an optical element comprises providing an interferometer optics; arranging a calibrating substrate in a beam of measuring light emitted by the interferometer optics; superimposing measuring light having traversed the first and second surfaces of the calibrating substrate with reference light, and taking a first interferometric measurement of the superimposed measuring light and reference light; arranging the aspherical surface of the optical element in the beam of measuring light emitted by the interferometer optics, while the calibrating substrate is not arranged in the beam of measuring light; superimposing measuring light having interacted with the aspherical surface and the reference light, and taking a second interferometric measurement of the superimposed measuring light and reference light; determining deviations of the aspherical surface from a target shape thereof in dependence of the first and second measurements; and machining the aspherical surface of the optical element.
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