PHOTORESIST COATING APPARATUS

摘要

A photoresist solution coater structure is provided to keep the uniformity of thickness of a photoresist layer in a predetermined range by removing effectively volatile components and bubbles from a photoresist solution of a photoresist storing unit. A photoresist solution coater structure includes a photoresist supply unit and a slit coater(30) connected through the photoresist supply unit. The slit coater is composed of a body(40), a photoresist storing part(50) for storing a photoresist solution in the body, a photoresist spraying part(60) for spraying the photoresist solution to a substrate under the photoresist storing part, a vibration generator(70) for generating vibration to the photoresist solution of the photoresist storing part, and an exhaust part(80) for exhausting volatile components and bubbles from the photoresist solution.