发明名称 METHOD FOR FORMING A POROUS REACTION INJECTION MOLDED CHEMICAL MECHANICAL POLISHING PAD
摘要 Formation of a chemical-mechanical polishing cushion comprises: providing a tank, a storage silo with micro-bead, an isocyanates storage tank with isocyanates; delivering the polymer materials and the micro-beads to a premix producing tank; forming the premix from polymer materials and the micro beads; delivering the premix to the premix producing tank; forming a mixture from the premix and the isocyanates; injecting the mixture in a closed form tool; hardening the polishing cushion in the form tool; and degassing at least one of the tank, isocyanates storage tank and the form tool. Formation of a chemical-mechanical polishing cushion comprises: providing a tank with polymer material; providing a storage silo with micro-bead; providing an isocyanates storage tank with isocyanates; delivering the polymer materials and the micro-beads to a premix producing tank; forming the premix from polymer materials and the micro beads; delivering the premix to the premix producing tank; forming a mixture from the premix and the isocyanates; injecting the mixture in a closed form tool; hardening the polishing cushion in the form tool; and degassing at least one of the tank, isocyanates storage tank and the form tool.
申请公布号 KR20060107306(A) 申请公布日期 2006.10.13
申请号 KR20060029379 申请日期 2006.03.31
申请人 ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. 发明人 JAMES DAVID B.;ROBERTS JOHN V.H.
分类号 B24D99/00;H01L21/304;B29D99/00 主分类号 B24D99/00
代理机构 代理人
主权项
地址