发明名称 |
METHOD FOR FORMING A POROUS REACTION INJECTION MOLDED CHEMICAL MECHANICAL POLISHING PAD |
摘要 |
Formation of a chemical-mechanical polishing cushion comprises: providing a tank, a storage silo with micro-bead, an isocyanates storage tank with isocyanates; delivering the polymer materials and the micro-beads to a premix producing tank; forming the premix from polymer materials and the micro beads; delivering the premix to the premix producing tank; forming a mixture from the premix and the isocyanates; injecting the mixture in a closed form tool; hardening the polishing cushion in the form tool; and degassing at least one of the tank, isocyanates storage tank and the form tool. Formation of a chemical-mechanical polishing cushion comprises: providing a tank with polymer material; providing a storage silo with micro-bead; providing an isocyanates storage tank with isocyanates; delivering the polymer materials and the micro-beads to a premix producing tank; forming the premix from polymer materials and the micro beads; delivering the premix to the premix producing tank; forming a mixture from the premix and the isocyanates; injecting the mixture in a closed form tool; hardening the polishing cushion in the form tool; and degassing at least one of the tank, isocyanates storage tank and the form tool. |
申请公布号 |
KR20060107306(A) |
申请公布日期 |
2006.10.13 |
申请号 |
KR20060029379 |
申请日期 |
2006.03.31 |
申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. |
发明人 |
JAMES DAVID B.;ROBERTS JOHN V.H. |
分类号 |
B24D99/00;H01L21/304;B29D99/00 |
主分类号 |
B24D99/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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