| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid (500) between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor (228) includes an array of outlets (224) configured to minimize vibrations. |
| 申请公布号 |
KR20060107357(A) |
申请公布日期 |
2006.10.13 |
| 申请号 |
KR20060031143 |
申请日期 |
2006.04.05 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BECKERS MARCEL;DONDERS SJOERD NICOLAAS LAMBERTUS;HOOGENDAM CHRISTIAAN ALEXANDER;JACOBS JOHANNES HENRICUS WILHELMUS;TEN KATE NICOLAAS;KEMPER NICOLAAS RUDOLF;MIGCHELBRINK FERDY;EVERS ELMAR |
| 分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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