发明名称 PLATING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a plating method for forming a metallic layer with high reliability in a simple process. SOLUTION: The plating method comprises the steps of: (a) forming an underlayer 10 on a substrate; (b) forming a surface active agent layer 12 on the underlayer 10; (c) patterning the surface active agent layer 12 to expose the underlayer 10; (d) immersing the substrate into a solution; (e) forming a catalyst layer 26 on the underlayer 10 and on a surface active agent layer 14; (f) patterning the catalyst layer 26 by removing the surface active agent layer 14; and (g) depositing the metallic layer 28 on the catalyst layer 26. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006274395(A) 申请公布日期 2006.10.12
申请号 JP20050097979 申请日期 2005.03.30
申请人 SEIKO EPSON CORP 发明人 KIMURA SATOSHI;FURUHATA HIDEMICHI
分类号 C23C18/18;H01L21/28;H01L21/288;H01L21/3205;H05K3/18 主分类号 C23C18/18
代理机构 代理人
主权项
地址