发明名称 PROCESS MANAGEMENT SYSTEM, PROCESS MANAGEMENT METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a process management system capable of minimizing processing wait time between two processes where mutually different processings are executed for the same wafer. <P>SOLUTION: The process management system for processing a plurality of lots in parallel comprises first and second semiconductor manufacturing apparatuses 31, 32 for continuously executing mutually different processings for the same wafer 9 without exposing the wafer to the atmosphere; a recipe storage 21 for storing data of a recipe on which processing times of the respective first and second semiconductor manufacturing apparatuses 31, 32 are listed; processing time determination means 13 for determining processing times of the first and second semiconductor manufacturing apparatuses 31, 32, so as for the processing wait time of the first and second semiconductor manufacturing apparatuses 31, 32, to be minimum on the basis of the data of the recipe; and apparatus control means 14 for making the first and second semiconductor manufacturing apparatuses 31, 32 process in parallel at the processing times of the determined first and second semiconductor manufacturing apparatuses 31, 32. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2006278531(A) 申请公布日期 2006.10.12
申请号 JP20050092736 申请日期 2005.03.28
申请人 TOSHIBA CORP 发明人 SAKI KAZUROU
分类号 H01L21/31;H01L21/02;H01L21/318;H01L21/677 主分类号 H01L21/31
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