| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device capable of aligning masks and a material to be exposed with high precision by suppressing flection of the material to be exposed due to its own weight. <P>SOLUTION: In the exposure device which sends a horizontally carried sheet type material to be exposed 2 to an exposure position P, brings a top mask 8 and a reverse mask 9 arranged above and below the material to be exposed into contact to perform alignment, and then transfers patterns of the top and reverse masks to both surfaces of the material to be exposed through exposure, the material to be exposed disposed downstream from the exposure position in the carrying direction is fixed with a fixing clamp 5b before being aligned, and a back tension roll 6 is used to apply a tensile force which is small enough not to extend the material to be exposed upstream to the exposed exposure material disposed upstream from the exposure position in the carrying direction. While the fine tensile force is thus applied to the material to be exposed, the top mask and reverse mask are brought into contact with the material to be exposed for the alignment. <P>COPYRIGHT: (C)2007,JPO&INPIT |
