| 摘要 |
PROBLEM TO BE SOLVED: To realize a method of accurately correcting the beam position of a charged particle beam pattern writer. SOLUTION: The method comprises (101) a step of executing the metrological measurement at a plurality of mark positions in the forward and reverse orders to obtain the position error, pitching value and yawing value at every mark position in mutually perpendicular two axes directions, (101) obtaining the difference of the position errors, the pitching values and the yawing values at every mark position between the forward and reverse orders in the mutually perpendicular two axes directions, (103) simulating the beam position correction effect at every mark position due to the Abbe error with respect to a plurality of previously assumed Abbe errors to specify two kinds of Abbe errors as Abbe errors in the mutually perpendicular directions where the difference of the position errors between the forward and reverse orders is minimum in the mutually perpendicular directions through the plurality of mark positions, and (104) correcting the beam position, using these Abbe errors. COPYRIGHT: (C)2007,JPO&INPIT
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