发明名称 METHOD AND APPARATUS FOR FORMING THIN FILM
摘要 PROBLEM TO BE SOLVED: To realize an organic thin film forming apparatus capable of efficiently and easily forming tandem lamination type organic thin film function elements having a plurality of different structures and film compositions within the same vacuum chamber. SOLUTION: The thin film forming apparatus is equipped with a vacuum chamber, a plurality of small deposition chambers which are formed within the vacuum chamber and are capable of maintaining each independent deposition chamber atmosphere, at least one of a vapor deposition source arranged in the respective small deposition chamber, a substrate holding means which arranges a substrate in the prescribed deposition position facing the vapor deposition source, and a transfer mechanism which drives the substrate holding means. The apparatus is so configured that the arbitrary substrates are arranged in the arbitrary small deposition chambers by using the transfer mechanism and that the substrates are respectively independently subjected to the deposition in the respective small deposition chambers for the desired time. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006274396(A) 申请公布日期 2006.10.12
申请号 JP20050098032 申请日期 2005.03.30
申请人 SHOWA SHINKU:KK 发明人 ATAMI AKIHIKO;YAMAMOTO TOKUICHI;SAKAI HIROSHI
分类号 C23C14/24;H01L51/50;H05B33/10 主分类号 C23C14/24
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