| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning apparatus and a cleaning method which enable the removal of flux and fine particles deposited on a photoreception face of an image sensor, reduction of re-deposit of flux and fine particles to a substrate within a cleaning liquid, and improvement of yields after cleaning. SOLUTION: An embodiment of the present invention is a method for cleaning a substrate unit, which comprises immersing image-pick-up substrate unit in a cleaning liquid, spraying the cleaning liquid supplied from outside using a nozzle, that is, from the direction orthogonal to a second surface, to an opening of the image-pick-up substrate unit, vibrating, simultaneously with the spraying step, the image-pick-up substrate unit and the nozzle along the direction parallel to a first face of the substrate while keeping the positional relationship between the image-pick-up substrate unit and the nozzle, and applying, simultaneously with the spraying step, ultrasonic vibration to the image-pick-up substrate unit. COPYRIGHT: (C)2007,JPO&INPIT
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