| 摘要 |
PROBLEM TO BE SOLVED: To provide a sulfuric-acid recycling type washing system for effectively washing a material to be washed such as a semiconductor wafer. SOLUTION: The sulfuric-acid recycling type washing system has a washing unit 1 for washing the material to be washed using a persulfuric acid solution as a washing liquid, an electrolysis reaction unit 20 for regenerating the persulfuric acid solution by forming a persulfuric acid ion from a sulfuric acid ion contained in the solution by an electrolysis reaction, a circulation line 4, 5, 6, 10, 11 for making the solution circulate between the washing unit 1 and the electrolysis reaction unit 20, an SS removing unit 12 having an SS capturing filter 13 for catching an SS in the solution. The SS removing unit is arranged through the circulation line 10 of a washing tank 1a of the first washing order of a plurality of washing tanks. The washing tank 1a of the first washing order can independently circulate the washing liquid and a washing tank 1b, 1b of the following washing order can serially circulate the washing liquid. The persufuric acid solution is regenerated by the electrolysis reaction unit and can be used for washing. An SS formed in the system can be effectively removed by the SS removing unit. COPYRIGHT: (C)2007,JPO&INPIT
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