Aluminum-based sputtering targets

摘要

An Al-based sputtering target mainly containing Al has a total number of concave defects having largest depths of 0.2 mum or more and equivalent area diameters of 0.2 mum or more of 45000 or less per square millimeter of unit surface area of a surface of the sputtering target corresponding to a sputtering plane. Another Al-based sputtering target has a total number of concave defects having largest depths of 0.1 mum or more and equivalent area diameters of 0.5 mum or more of 15000 or less per square millimeter of unit surface area on the surface. These sputtering targets are reduced in time period and number of sputtering failures (a splash and/or an arc) occurring in their use, particularly at an early stage of their use.