SLOTTED THIN-FILM SPUTTER DEPOSITION TARGETS FOR FERROMAGNETIC MATERIALS
摘要
A slotted sputtering target (16) for a magnetron sputtering system (10) for thin-film deposition particularly suited for ferromagnetic target materials such as cobalt, nickel, and iron or an alloy including more than one of these elements.
申请公布号
WO2006023321(A3)
申请公布日期
2006.10.12
申请号
WO2005US28176
申请日期
2005.08.10
申请人
WILLIAMS ADVANCED MATERIALS, INC.;WILLSON, MATTHEW, T.;GROHMAN, HENRY, L.
