| 摘要 |
PROBLEM TO BE SOLVED: To efficiently remove fine particles sticking to a brush when cleaning a substrate while suppressing the degradation of the brush. SOLUTION: In a substrate cleaning device 1, a first cleaning liquid is applied to a substrate 9 from a substrate cleaning nozzle 24 while the substrate 9 is scribed with a brush 31 to clean the substrate 9. When the substrate 9 is not cleaned, a second cleaning liquid is applied to the brush 31 from a cleaning liquid nozzle provided to a standby pot 41 to clean the brush 31. Here, the second cleaning liquid used by the substrate cleaning device 1 has an almost neutral hydrogen ion index pH 6.5, and the F potential of the brush 31 in the second cleaning liquid and that of fine particles sticking to the brush 31 by cleaning the substrate 9 have the same polarities. Therefor, the fine particles sticking to the brush 31 during the cleaning of the substrate 9 are efficiently removed from the brush 31 while suppressing the degradation of the brush 31. COPYRIGHT: (C)2007,JPO&INPIT
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